fe(co)5  (Elemental Microanalysis Ltd)

Journal: Beilstein Journal of Nanotechnology

Article Title: Electron-induced deposition using Fe(CO) 4 MA and Fe(CO) 5 – effect of MA ligand and process conditions

doi: 10.3762/bjnano.15.45

Figure Lengend Snippet: Molecular structures of (left) tetracarbonyliron(η 2 -methyl acrylate) (Fe(CO) 4 MA) and (right) iron pentacarbonyl (Fe(CO) 5 ).

Article Snippet: Fe(CO) 5 was purchased from Sigma-Aldrich in a stated purity of >99.99%.

Techniques:

Journal: Beilstein Journal of Nanotechnology

Article Title: Electron-induced deposition using Fe(CO) 4 MA and Fe(CO) 5 – effect of MA ligand and process conditions

doi: 10.3762/bjnano.15.45

Figure Lengend Snippet: AES intensities for Ta NNN (green), C KLL (yellow), O KLL (blue), and Fe LMM (red) measured as peak-to-peak height within the differentiated AES data during four individual control experiments. In each experiment and for each element, the leftmost bar represents the AES data recorded after sputter cleaning of the Ta substrate. The other two bars represent data recorded after each of two subsequent process steps (deposits 1 and 2) during each of which (a) the substrate was cooled to 100 K followed by two TDS runs without prior leaking of precursor, (b) the substrate was irradiated with electrons (50 eV, 10000 µC/cm 2 ) at room temperature without leaking of precursor, (c) the substrate was cooled to 100 K followed by two TDS runs performed each after leaking Fe(CO) 5 (2.5 mTorr) onto the substrate held at 100 K, and (d) the substrate was cooled to 100 K followed by two TDS runs performed each after leaking Fe(CO) 4 MA (2.5 mTorr) onto the substrate held at 100 K. In each case, AES data were acquired when the substrate had returned to room temperature. The data in (c) and (d) each represent the average of two individual experiments (see also , Tables S1 and S2).

Article Snippet: Fe(CO) 5 was purchased from Sigma-Aldrich in a stated purity of >99.99%.

Techniques: Irradiation

Journal: Beilstein Journal of Nanotechnology

Article Title: Electron-induced deposition using Fe(CO) 4 MA and Fe(CO) 5 – effect of MA ligand and process conditions

doi: 10.3762/bjnano.15.45

Figure Lengend Snippet: AES intensities for Ta NNN (green), C KLL (yellow), O KLL (blue), and Fe LMM (red) measured as peak-to-peak height within the differentiated AES data during five individual deposition experiments. In each experiment and for each element, the leftmost bar represents the AES data recorded after sputter cleaning of the Ta substrate. The other two bars represent data recorded after each of two subsequent deposition steps (deposits 1 and 2). EBID steps were performed with the substrate held at room temperature during (a) simultaneous irradiation with electrons (50 eV, 10000 µC/cm 2 ) and leaking of Fe(CO) 5 (5 mTorr), (b) simultaneous irradiation with electrons (50 eV, 10000 µC/cm 2 ) and leaking of Fe(CO) 4 MA (5 mTorr), and (c) simultaneous irradiation with electrons (100 eV, 10000 µC/cm 2 ) and leaking of Fe(CO) 4 MA (5 mTorr). For cryo-EBID steps with (d) Fe(CO) 5 and (e) Fe(CO) 4 MA, the precursors (5 mTorr) were condensed onto the Ta substrate cooled to 100 K and irradiated with electrons (50 eV, 10000 µC/cm 2 ) at that temperature. Each deposition step was followed by a TDS run. In each case, AES data were acquired when the substrate had returned to room temperature. All data represent the average of two individual experiments (see also , Tables S1 and S2).

Article Snippet: Fe(CO) 5 was purchased from Sigma-Aldrich in a stated purity of >99.99%.

Techniques: Irradiation

Journal: Beilstein Journal of Nanotechnology

Article Title: Electron-induced deposition using Fe(CO) 4 MA and Fe(CO) 5 – effect of MA ligand and process conditions

doi: 10.3762/bjnano.15.45

Figure Lengend Snippet: AES intensities for Ta NNN (green), C KLL (yellow), O KLL (blue), and Fe LMM (red) measured as peak-to-peak height within the differentiated AES data during two individual deposition experiments. In each experiment and for each element, the leftmost bar represents the AES data recorded after sputter cleaning of the Ta substrate. The second bar represents the AES data recorded after deposition of an Fe seed layer from Fe(CO) 5 by EBID which was performed during simultaneous irradiation with electrons (50 eV, 10000 µC/cm 2 ) and leaking of Fe(CO) 5 (5 mTorr) with the substrate held at room temperature. The other two bars represent data recorded after each of two subsequent AG steps (AG 1 and 2) using (a) Fe(CO) 5 and (b) Fe(CO) 4 MA. AG was performed by leaking the precursors (5 mTorr) onto the substrate held again at room temperature. Each deposition step was followed by a TDS run. In each case, AES data were acquired when the substrate had returned to room temperature. All data represent the average of two individual experiments (see also , Tables S1 and S2).

Article Snippet: Fe(CO) 5 was purchased from Sigma-Aldrich in a stated purity of >99.99%.

Techniques: Irradiation